Lattice strain relaxation in thin Mo films grown heteroepitaxially on MgO single crystals

Cejpek, P.; Motylenko, M.; Rafaja, D.

doi:10.1107/S1600576726000233

Journal of Applied Crystallography Journal of Applied
Crystallography

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Figure 6
Pole figures of the Mo film deposited on the (011)-oriented MgO substrate. Left panels: measured pole figures {110}, {200} and {211} (from the top to the bottom). The diffracted intensities are shown in logarithmic scale. Right panels: corresponding pole figures simulated for the orientation relationships $[(112)_{\rm{Mo}}\parallel (011)_{\rm{MgO}},[\bar{1}10]_{\rm{Mo}}\parallel [\bar{1}00]_{\rm{MgO}}]$ (blue filled circles) and $[(112)_{\rm{Mo}}\parallel (011)_{\rm{MgO}},[1\bar{1}0]_{\rm{Mo}}\parallel [\bar{1}00]_{\rm{MgO}}]$ (red open boxes). The dashed circles in the right panel indicate the limit of the sample inclination ( $[|\chi| = 75^{\circ}]$ ) (see left panel). The weak and diffuse intensity maxima in the measured pole figures having no counterparts in the simulation stem from the tails of the MgO reflections.

JOURNAL OF
APPLIED
CRYSTALLOGRAPHY

ISSN: 1600-5767

Volume 59| Part 1| February 2026| Pages 190-205

https://doi.org/10.1107/S1600576726000233

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