LaueMatching: an approach for rapid and robust indexing of Laue diffraction patterns

Sharma, H.; Sheyfer, D.; Harder, R.; Tischler, J.Z.

doi:10.1107/S1600576726001196

Journal of Applied Crystallography Journal of Applied
Crystallography

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Figure 11
For the simulation shown in Fig. 10

, (a) gives the misorientation, in degrees, between the orientations used to simulate the diffraction pattern ( $[O_{\rm sim}]$ ) and the refined orientations from LaueMatching ( $[O_{\rm ref}]$ ). (b) A histogram plot of Euclidean distance between the computed peak positions from $[O_{\rm sim}]$ and $[O_{\rm ref}]$ . The mean difference is 0.088 pixels, while the maximum is 0.379 pixels.

JOURNAL OF
APPLIED
CRYSTALLOGRAPHY

ISSN: 1600-5767

Volume 59| Part 2| April 2026| Pages 552-563

https://doi.org/10.1107/S1600576726001196

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