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Figure 5
The dependence of the scattering pattern on orientation. (a) A simulated pattern for a tilting angle of 0°, the normal incidence case. (b) A typical scattering pattern when the tilting angle is 45°. There are two strong streaks when the incident beam is perpendicular to the particle surface as in panel (a), but the features for the scattering pattern at a tilting angle of 45° are less pronounced. (c) Total intensity plotted as a function of tilting angle. We simulated 500 patterns for each tilting angle. The overall intensity within the q range 0.44–0.89 nm−1 is calculated, showing that the overall intensity is lower for cases where the tilting angle is around 45°, while the standard deviations (error bars) for the intensity indicate larger fluctuations for the same group of patterns.

IUCrJ
Volume 4| Part 6| November 2017| Pages 741-750
ISSN: 2052-2525
https://doi.org/10.1107/S2052252517012398