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Figure 2
(a) PDF data and refinement of a 3 nm sputter-deposited Pt layer on fused silica; Rw = 24% for the r fitting range 1.75–60 Å (shown only to 30 Å for clarity); (b) PDFs of HfO2 thin films of different thicknesses on fused silica deposited by chemical solution deposition and heat-treated at the indicated temperatures [offset in G(r) for clarity]. The film thickness increases in steps owing to the preparation by stacking multiple coatings of 15 nm each, i.e. the samples correspond to 1, 2 and 3 coatings, respectively.

IUCrJ
Volume 6| Part 2| March 2019| Pages 290-298
ISSN: 2052-2525
https://doi.org/10.1107/S2052252519000514