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Figure 9
The microstructure of the low-melting-point metal polycrystalline Bi thin films with different growth rates (the thickness is 30 nm and the substrate temperature is 70°C). (a) EBSD images of Bi thin films (thickness 30 nm) with different growth rates at 0.19, 0.47 and 1.61 Å min−1. The color code shows the crystallographic orientation with respect to [0001]. (b) AFM images (1 × 1 µm) of Bi thin films with different growth rates at 0.19, 0.47 and 1.61 Å min−1.

IUCrJ
Volume 7| Part 1| January 2020| Pages 49-57
ISSN: 2052-2525
https://doi.org/10.1107/S2052252519015458