Diffraction Behaviour of Three-Component Fibonacci Ta/Al Multilayer Films

A class of quasiperiodic structure three-component Fibonacci (3CF) Ta/Al multilayer films is fabricated by dual-target magnetron sputtering. The microstructure of this film is investigated by transmission electron microscopy and electron and X-ray diffraction. Cross-section transmission electron microscopy demonstrates a well formed layer structure of 3CF Ta/Al superlattices. The electron-diffraction satellite spots, which can be indexed by three integers, correspond to the X-ray diffraction peaks in both position and intensity. The scattering vectors observed in electron and X-ray diffraction are in good agreement with the analytical treatment from the projection method.