Figure 2
Schematic view of the experimental set-up. X-rays (λ = 0.1 nm), monochromated by a pair of Si(220) perfect crystals, are incident upon a triple Laue-case X-ray interferometer. In the interferometer, an Si(110) wafer of 400 µm thickness is inserted into one of the two coherent beam-paths. The wafer was adjusted to near the 220 Bragg diffraction condition. A silicon slab of 1.5 mm thickness was inserted into another beam path to balance the intensity of the two coherent beams. The intensities of the interfering outgoing beams (O-beam and H-beam) are measured by NaI scintillation counters. |