(Ta/Si) multilayer as a wide-bandpass monochromator material

Park, Y.J.; Youn, H.S.; Banerjee, S.; Lee, D.R.; Baik, H.M.; Lee, K.-B.; Kim, K.J.; Moon, D.W.

doi:10.1107/S0909049597020311

Journal of Synchrotron Radiation Journal of
Synchrotron Radiation

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Figure 1
Measured reflectivity intensities of a (Ta/Si)₆₀ multilayer: (a) a specular scan and (b) an off-specular scan with an offset angle of 0.1°. Solid lines represent the results of the fitting.

JOURNAL OF
SYNCHROTRON
RADIATION

ISSN: 1600-5775

Volume 5| Part 3| May 1998| Pages 705-707

https://doi.org/10.1107/S0909049597020311

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