Synchrotron Radiation Lithography for Manufacturing Integrated Circuits Beyond 100 nm

Kinoshita, H.; Watanabe, T.; Niibe, M.

doi:10.1107/S0909049597017615

Journal of Synchrotron Radiation Journal of
Synchrotron Radiation

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Figure 5
Imaging optics for EUVL. (a) Two-aspherical-mirror optics designed by NTT. (b) Three-aspherical-mirror optics designed by HIT. M: mask; W: wafer; m₁, m₂, m₃: aspherical mirrors; PM: plane mirror.

JOURNAL OF
SYNCHROTRON
RADIATION

ISSN: 1600-5775

Volume 5| Part 3| May 1998| Pages 320-325

https://doi.org/10.1107/S0909049597017615

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