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Figure 1
AFM surface profiles of different supporting membranes. (a) As-deposited SiN, (b) back-surface of SiN, (c) polished SiN, (d) as-deposited ECR-plasma CVD SiC, (e) polished Si wafer substrate, and (f) another portion of polished SiN (showing scratches).

Journal logoJOURNAL OF
SYNCHROTRON
RADIATION
ISSN: 1600-5775
Volume 5| Part 3| May 1998| Pages 690-692
https://doi.org/10.1107/S0909049597019389
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