Journal of Synchrotron Radiation
Journal of
Synchrotron Radiation
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Figure 1
Sample growth is monitored in a layer-by-layer fashion using RHEED intensity oscillations. The shutters of the evaporators are controlled by a phase-locked epitaxy technique using a computer.
JOURNAL OF
SYNCHROTRON
RADIATION
ISSN: 1600-5775
Volume 5
|
Part 3
|
May 1998
|
Pages 1038-1040
https://doi.org/10.1107/S0909049597016129
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