Ultrahigh-Vacuum Reaction Apparatus to Study Synchrotron-Radiation-Stimulated Processes

Hirano, S.; Yoshigoe, A.; Nagasono, M.; Mase, K.; Ohara, J.; Nonogaki, Y.; Takeda, Y.; Urisu, T.

doi:10.1107/S0909049598011534

Journal of Synchrotron Radiation Journal of
Synchrotron Radiation

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Figure 5
Dependence of the etched depth on the SF₆ gas pressure. The synchrotron radiation irradiation dose was 1 × 10⁴ mA min. Observed values at 1 × 10⁻⁷ torr and 5 × 10⁻⁶ torr are within the measurement error (∼±5 nm).

JOURNAL OF
SYNCHROTRON
RADIATION

ISSN: 1600-5775

Volume 5| Part 6| November 1998| Pages 1363-1368

https://doi.org/10.1107/S0909049598011534

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