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Figure 2
Scanning electron micrographs of a wet-etched silicon Fresnel zone plate. The smallest half-pitch is 300 nm, the lens width is 200 µm. The achievable aspect ratio was limited by distortions of the structures caused by capillary forces during drying.

Journal logoJOURNAL OF
SYNCHROTRON
RADIATION
ISSN: 1600-5775
Volume 8| Part 3| May 2001| Pages 1054-1055
doi:10.1107/S0909049501002746
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