view article
Figure 5
GISAXS scattering pattern on a Cu + Co-implanted silica (implantation fluence = 6 × 1016 ions cm-2 for each ion species, implantation energy = 100 keV and 90 keV for Cu+ and Co+ ions, respectively). The data were collected on the ID1 beamline at ESRF using an 8.0 keV beam and a two-dimensional gas-filled detector. The sample-to-detector distance was 3250 mm, the coordinates indicate the pixel number (1 pixel = 200 µm, 100 pixels = 0.025 Å-1) and the gray scale is linear with the scattered intensity. In this case the scattering pattern consists only of a pair of side lobes, indicating that the particles are arranged in a plane parallel to the glass surface.

Journal logoJOURNAL OF
SYNCHROTRON
RADIATION
ISSN: 1600-5775
Volume 11| Part 3| April 2004| Pages 272-277
doi:10.1107/S0909049504002523
Follow J. Synchrotron Rad.
Sign up for e-alerts
E-alerts
Follow J. Synchrotron Rad. on Twitter
Twitter
Follow us on facebook
Facebook
Sign up for RSS feeds
RSS