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Figure 7
Example of the typical morphology of a metal-implanted glass. Here a cross-sectional bright-field TEM micrograph of a Cu + Ni-implanted silica sample is shown. The implantation energies were 90 keV and 100 keV for Cu and Ni ions, respectively. The implantation fluences were 6 × 1016 ions cm-2 for each ion species.

Journal logoJOURNAL OF
SYNCHROTRON
RADIATION
ISSN: 1600-5775
Volume 11| Part 3| April 2004| Pages 272-277
doi:10.1107/S0909049504002523
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