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Figure 1
Scanning electron micrograph of silicon structures generated by electron-beam lithography and reactive ion etching used as a two-dimensional phase grating.

Journal logoJOURNAL OF
SYNCHROTRON
RADIATION
ISSN: 1600-5775
Volume 11| Part 6| November 2004| Pages 476-482
https://doi.org/10.1107/S0909049504024811
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