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Figure 4
Evaluation of radical migration in a PMMA-blend-PAN microphase-separated film. (a) Optical density image at 286.8 eV (PAN is white). (b) Optical density image of the same region at 288.4 eV (PMMA is white). The lines labeled a, b, c, d, e were exposed to various doses at 320 eV prior to recording these images. (c) Plot of the average width of the damage lines in the PAN and PMMA material as a function of the dose. The data points are the measured line width (FWHM) at the indicated radiation doses for PMMA and PAN, respectively. The lines are fits of those data points to w = wo + a exp(d/dc). (d) Plot of the average width of the damage lines in the PAN and PMMA material as a function of ratio-to-critical dose (60 × 106 Gy for PMMA, 150 × 106 Gy for PAN).

Journal logoJOURNAL OF
SYNCHROTRON
RADIATION
ISSN: 1600-5775
Volume 14| Part 2| March 2007| Pages 181-190
doi:10.1107/S0909049506053829
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