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Figure 5
Demonstration of chemically selective patterning for PMMA/PAN bilayer and PECA. (a) LBNL logo input file, with the roof in red (PMMA) and the window/tower in blue (PAN). The lower images are color-coded composites derived from STXM images recorded at 286.8 eV (PAN damage, indicated in blue) and 288.4 eV (PMMA damage, indicated in red) of regions of (b) the PAN/PMMA bilayer and (c) PECA, into which the patterns indicated in (a) were written. Gradient patterns selectively generated in the PMMA/PAN bilayer system. (d) Logo for the Canadian Light Source (CLS). (e) `Smokie' the cat (photograph courtesy of S. G. Urquhart). A different scheme to colorize the damage was used in this case. The input to make each image is shown as an inset.

Journal logoJOURNAL OF
SYNCHROTRON
RADIATION
ISSN: 1600-5775
Volume 14| Part 2| March 2007| Pages 181-190
doi:10.1107/S0909049506053829
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