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Figure 1
(a) Scheme showing the equivalence between a Fresnel zone plate and the beam-shaping condenser. (b) Optical microscope image and scanning electron microscope image of the central part (inset) of the silicon beam-shaper consisting of 400 subfields (50 µm × 50 µm). The outermost subgratings have a period of 100 nm.

Journal logoJOURNAL OF
SYNCHROTRON
RADIATION
ISSN: 1600-5775
Volume 15| Part 1| December 2008| Pages 106-108
doi:10.1107/S0909049507047711
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