Fabrication of high-aspect-ratio Fresnel zone plates by e-beam lithography and electroplating

Chen, Y.T.; Lo, T.N.; Chiu, C.W.; Wang, J.Y.; Wang, C.L.; Liu, C.J.; Wu, S.R.; Jeng, S.T.; Yang, C.C.; Shiue, J.; Chen, C.H.; Hwu, Y.; Yin, G.C.; Lin, H.M.; Je, J.H.; Margaritondo, G.

doi:10.1107/S0909049507063510

Journal of Synchrotron Radiation Journal of
Synchrotron Radiation

IUCr IT WDC

home archive editors for authors for readers submit subscribe open access

view article

Figure 3
Scanning electron microscope (SEM) images of the test sample with optimized dose for patterning different lines: (a) 650 µC cm⁻² for 30 nm line, (b) 380 µC cm⁻² for 90 nm line, (c) 474 µC cm⁻² for 60 nm line, (d) pattern with Au structure after electrodeposition.

JOURNAL OF
SYNCHROTRON
RADIATION

ISSN: 1600-5775

Volume 15| Part 2| February 2008| Pages 170-175

doi:10.1107/S0909049507063510

Follow J. Synchrotron Rad.

Search IUCr Journals		doi		Advanced search
Author		volume	page