Fabrication of high-aspect-ratio Fresnel zone plates by e-beam lithography and electroplating

Chen, Y.T.; Lo, T.N.; Chiu, C.W.; Wang, J.Y.; Wang, C.L.; Liu, C.J.; Wu, S.R.; Jeng, S.T.; Yang, C.C.; Shiue, J.; Chen, C.H.; Hwu, Y.; Yin, G.C.; Lin, H.M.; Je, J.H.; Margaritondo, G.

doi:10.1107/S0909049507063510

Journal of Synchrotron Radiation Journal of
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Figure 5
SEM images of a FZP pattern on PMMA A6 resist under different bake-out conditions after development: (a) 408 K for 2 h, (b) 453 K for 24 h.

JOURNAL OF
SYNCHROTRON
RADIATION

ISSN: 1600-5775

Volume 15| Part 2| February 2008| Pages 170-175

doi:10.1107/S0909049507063510

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