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Figure 6
FZP pattern on PMMA A6 resist after using IPA and water mixture (7:3) as developer and a development time of 60 s.

Journal logoJOURNAL OF
SYNCHROTRON
RADIATION
ISSN: 1600-5775
Volume 15| Part 2| February 2008| Pages 170-175
doi:10.1107/S0909049507063510
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