Fabrication of high-aspect-ratio Fresnel zone plates by e-beam lithography and electroplating

Chen, Y.T.; Lo, T.N.; Chiu, C.W.; Wang, J.Y.; Wang, C.L.; Liu, C.J.; Wu, S.R.; Jeng, S.T.; Yang, C.C.; Shiue, J.; Chen, C.H.; Hwu, Y.; Yin, G.C.; Lin, H.M.; Je, J.H.; Margaritondo, G.

doi:10.1107/S0909049507063510

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Figure 7
SEM images of FZP Au structures after electrodeposition. (a) 80 nm outermost zone width and 1000 nm thickness. (b) 30 nm outermost zone and 450 nm thickness.

JOURNAL OF
SYNCHROTRON
RADIATION

ISSN: 1600-5775

Volume 15| Part 2| February 2008| Pages 170-175

doi:10.1107/S0909049507063510

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