Figure 9
CCD frame measured in GIXD geometry for a multilayered InGaAs QD sample collected in the vicinity of the GaAs 022 substrate reflection (αi = 0.5°). T = 30 mm, D = 1000 mm, s2 = 1 mm. Besides the substrate reflection (S), the intensity distribution is caused by the sample surface and interfaces (CTR), the inhomogeneous strain distribution (W) and the spatial ordering (P) of the QDs. |