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Figure 3
Arrangement used to align two crossed lenses, separated by 80 mm. The Ge wafers with the etched lenses are visible. To be able to obtain a stigmatic image, the two lenses were fabricated with 80 mm difference in their focal lengths. Each wafer is mounted on top of several piezo-stages for the alignment. The entire system is carried by one of the stages on the optics test bench at B16 of Diamond.

Journal logoJOURNAL OF
SYNCHROTRON
RADIATION
ISSN: 1600-5775
Volume 16| Part 3| March 2009| Pages 325-329
doi:10.1107/S0909049509003215
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