Surface-sensitive reflection-mode EXAFS from layered sample systems: the influence of surface and interface roughness

Keil, P.; Lützenkirchen-Hecht, D.

doi:10.1107/S0909049509015684

Figure 10
Specular X-ray reflectivity (symbols) and fit (line) for 8048 eV photons (λ = 1.54 Å) of the oxidized Cu metal thin film with the corresponding EXAFS data shown in Figs. 8

and 9

. The data refinement was performed by assuming a CuO/Cu₂O double-layered oxide structure on top of the thin copper film. The fit results are: d₁(CuO) = 2.2 nm, d₂(Cu₂O) = 3.2 nm and d₃(Cu metal) = 90.9 nm, ρ₁(CuO) = 6.1 g cm⁻³, ρ₂(Cu₂O) = 5.7 g cm⁻³ and ρ₃(Cu metal) = 8.4 g cm⁻³, σ₁ = σ₂ = σ₃ = 12 Å and σ₄ = 4 Å, whereas the same value for the roughness was assumed for the data refinement for all the interfaces where the oxides are contributing. The inset displays a magnification of the region well above the critical angle of total reflection to resolve the thickness fringes more clearly. The vertical arrows indicate the maximal q_z values of the reflection-mode EXAFS data shown in Fig. 9

(Θ = 0.185°: 0.029 Å⁻¹ < q_z < 0.032 Å⁻¹; Θ = 0.24°: 0.038 Å⁻¹ < q_z < 0.041 Å⁻¹; Θ = 0.3°: 0.048 Å⁻¹ < q_z < 0.051 Å⁻¹; and Θ = 0.35°: 0.056 Å⁻¹ < q_z < 0.06 Å^-1.)

JOURNAL OF
SYNCHROTRON
RADIATION

ISSN: 1600-5775

Volume 16| Part 4| May 2009| Pages 443-454

doi:10.1107/S0909049509015684

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