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Figure 6
Systematic variations of the peaks belonging to the first Cu—O shell of the oxide at R1 (a), the first Cu—Cu shell of metallic copper at R2 (b), and the Cu—Cu shell of the oxide at R3 (c) as a function of the surface and interface r.m.s. roughness parameters σ1 and σ2 according to a simulation assuming a 3.5 nm-thick Cu2O film on Cu and an incidence angle of Θ = 0.2°.

Journal logoJOURNAL OF
SYNCHROTRON
RADIATION
ISSN: 1600-5775
Volume 16| Part 4| May 2009| Pages 443-454
doi:10.1107/S0909049509015684
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