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Figure 8
Comparison of the measured reflection-mode Cu K-edge EXAFS of an oxidized Cu metal thin film (black line) with calculated data assuming a double-layered oxide structure with d1(CuO) = 2.0 nm, d2(Cu2O) = 3.5 nm and d3(Cu metal) = 88 nm on a glass substrate. While the first simulation (red line) includes the roughness effects for the different surfaces and interfaces (i.e. σ1 = σ2 = σ3 = 13 Å for all the interfaces where the oxides are contributing, and σ4 = 4 Å for the interface between the smooth glass substrate and the Cu film), any surface roughness is neglected in the second simulation (blue line).

Journal logoJOURNAL OF
SYNCHROTRON
RADIATION
ISSN: 1600-5775
Volume 16| Part 4| May 2009| Pages 443-454
doi:10.1107/S0909049509015684
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