view article
Figure 9
Comparison of the Fourier transforms of measured reflection-mode Cu K-edge EXAFS of an oxidized Cu metal thin film (black line) with those of calculated data assuming a double-layered oxide structure with d1(CuO) = 2.0 nm, d2(Cu2O) = 3.5 nm and d3(Cu metal) = 88 nm on a glass substrate. While the first simulation (red line) includes the roughness effects for the different surfaces and interfaces (i.e. σ1 = σ2 = σ3 = 13 Å for all the interfaces where the oxides are contributing, and σ4 = 4 Å for the interface between the smooth glass substrate and the Cu film), any surface roughness is neglected in the second simulation (blue line). (k-range for the FTs: 1.75 Å−1 < k < 11.75 Å−1 for Θ = 0.185°; for all other experiments at larger angles, 1.75 Å−1 < k < 12.75 Å−1.)

Journal logoJOURNAL OF
SYNCHROTRON
RADIATION
ISSN: 1600-5775
Volume 16| Part 4| May 2009| Pages 443-454
doi:10.1107/S0909049509015684
Follow J. Synchrotron Rad.
Sign up for e-alerts
E-alerts
Follow J. Synchrotron Rad. on Twitter
Twitter
Follow us on facebook
Facebook
Sign up for RSS feeds
RSS