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Figure 1
Schematic structure of the SR XeF2 etching beamline at UVSOR. LS: light source; FCV: fast-closing valve; FM1, FM2: first and second focusing mirrors; FMC: second focusing mirror chamber; DPi (i = 1–3): differential pumping chambers; IPi (i = 1–2): ion pumps; TMPi (i = 1–4): turbomolecular pumps; EC: etching chamber; A: aperture. Distances from the light source are shown in the figure. The vacuum pressures under usual operations were ∼10−10 torr at the FM1 chamber and ∼10−9, ∼10−8, ∼10−7 and ∼10−4 torr at DP1, DP2, DP3 and FMC, respectively.

Journal logoJOURNAL OF
SYNCHROTRON
RADIATION
ISSN: 1600-5775
Volume 17| Part 1| January 2010| Pages 69-74
https://doi.org/10.1107/S0909049509045658
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