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Figure 1
Examples of stripe modulations in the flat-field image after reflection by multilayer mirrors of different materials, period d and number N of bi-layers, in use at different beamlines around the globe. (Note that these are not the multilayer samples which are under investigation in this paper.) The sketches below show the essential layout elements of each beamline: source (WLS: wavelength shifter; W: wiggler; U: undulator; BM: bending magnet), monochromator (DMM: double multilayer monochromator; SMM: single multilayer monochromator), and the distances L and D between source, multilayer and experimental station (S: sample; D: detector). The sketches do not show filters, windows, etc. Left: W/Si, N = 150, d = 2.88 nm at the BAMline, BESSY-II. Center: Ru/B4C, N = 65, d = 3.92 nm, at ESRF beamline ID19. Right: W/B4C, N = 200, d = 1.38 nm, at APS beamline 2-BM.

Journal logoJOURNAL OF
SYNCHROTRON
RADIATION
ISSN: 1600-5775
Volume 17| Part 4| May 2010| Pages 496-510
doi:10.1107/S0909049510011623
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