Figure 3
Vertical and horizontal beam profiles at 12 keV determined by knife-edge scan of a Ni thin film supported in a Si wafer. The fluorescence signal from the Ni film was measured using the continuous-scan mode. The recorded knife-edge data were fitted using a step function represented by the following equation: y = A1+(A2-A1)/{1+10[log(x0)-x] p}, where A1 = bottom asymptote; A2 = top asymptote; log(x0) = center; and p = hill slope. The step-function fitted curve was then derived (represented by open circles in the graph) and finally a Gaussian function was used to find the FWHM value of the profile. In the case of the horizontal profile, the FWHM value is corrected considering the knife-edge scan is performed on a sample aligned at a 45° angle relative to the incoming beam. Similar results are obtained at 9.0 keV and 13.5 keV. |