Hard X-ray microbeam lithography using a Fresnel zone plate with a long focal length

Lee, S.Y.; Cho, I.H.; Kim, J.M.; Kang, H.C.; Noh, D.Y.

doi:10.1107/S0909049510044535

Journal of Synchrotron Radiation Journal of
Synchrotron Radiation

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Figure 3
SEM images of the PR patterned by unfocused direct beam (a) and focused X-ray beam with exposure times of 4 s (b), 5 s (c) and 10 s (d), respectively.

JOURNAL OF
SYNCHROTRON
RADIATION

ISSN: 1600-5775

Volume 18| Part 2| March 2011| Pages 143-147

https://doi.org/10.1107/S0909049510044535

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