Hard X-ray microbeam lithography using a Fresnel zone plate with a long focal length

Lee, S.Y.; Cho, I.H.; Kim, J.M.; Kang, H.C.; Noh, D.Y.

doi:10.1107/S0909049510044535

Journal of Synchrotron Radiation Journal of
Synchrotron Radiation

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Figure 5
SEM image of the PR patterned by the hard X-ray beam at the focus position (a) and at 50 mm downstream of the focus position (b). The patterning area was enlarged away from the focus while the exposure time was increased.

JOURNAL OF
SYNCHROTRON
RADIATION

ISSN: 1600-5775

Volume 18| Part 2| March 2011| Pages 143-147

https://doi.org/10.1107/S0909049510044535

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