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Figure 6
Pattern fabricated with a WSi2(200 nm)–Si(100 nm) mask. The inset shows the line at the center whose thickness is about 100 nm.

Journal logoJOURNAL OF
SYNCHROTRON
RADIATION
ISSN: 1600-5775
Volume 18| Part 2| March 2011| Pages 143-147
https://doi.org/10.1107/S0909049510044535
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