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Figure 4
(a) Powder diffraction rings of a VC1–x sample deposited by DC magnetron sputtering. (b) Time-dependent intensity change of the VC(200) reflection at δ = 0° measured during the second deposition step. |
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Figure 4
(a) Powder diffraction rings of a VC1–x sample deposited by DC magnetron sputtering. (b) Time-dependent intensity change of the VC(200) reflection at δ = 0° measured during the second deposition step. |