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Figure 4
The rejection of higher harmonic contaminants on ID29. Top left: a plot of reflectivity versus photon energy for the flat Si mirrors used in the ID29 higher harmonic rejection system. Top right: the double-mirror system installed. Bottom: diffraction images collected at λ = 2.07 Å (E = 6.0 keV) showing the third-harmonic rejection obtained using the Si double-mirror system (right) and the Si(111) CCM pusher system (middle). For comparison, a diffraction image collected when no harmonic rejection was carried out is also shown (left). The diffraction pattern of the latter is clearly badly contaminated.

Journal logoJOURNAL OF
SYNCHROTRON
RADIATION
ISSN: 1600-5775
Volume 19| Part 3| March 2012| Pages 455-461
doi:10.1107/S0909049512009715
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