view article
Figure 6
Top: reconstruction error (difference between reconstructed and injection position) for a simulated flat-field illumination of the 20 and 25 µm pitches for an ENC of 340 e−. The smaller pitch shows a smaller reconstruction error. Bottom: reconstruction error distributions for the 20 µm-pitch strip for injection positions 0 µm (centred on the left strip) and 8 µm (close to the strip border) shown for an ENC of 340 e−. The differences between the two distributions are due to little charge sharing at injection point 0 µm. Gaussian fits give a reconstruction error σx of 1.38 ± 0.04 µm at the strip centre and 0.40 ± 0.03 µm close to the strip boundary.

Journal logoJOURNAL OF
SYNCHROTRON
RADIATION
ISSN: 1600-5775
Volume 19| Part 3| March 2012| Pages 359-365
doi:10.1107/S090904951200235X
Follow J. Synchrotron Rad.
Sign up for e-alerts
E-alerts
Follow J. Synchrotron Rad. on Twitter
Twitter
Follow us on facebook
Facebook
Sign up for RSS feeds
RSS