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Figure 2
(a) Optical micrograph (transmission, 100×) of an annealed PMMA sample after patterning with 300 eV X-rays. (b) Atomic force micrograph of PMMA after exposure [same area/doses for (a) and (b)]. (c) Plot of the height reduction of individual patterned areas versus dose. Results from different pre-exposure thermal treatments [as-spun, vacuum-dried (343 K, 2 × 10−2 torr, 24 h) and annealed (423 K, 1 h)] are compared.

Journal logoJOURNAL OF
SYNCHROTRON
RADIATION
ISSN: 1600-5775
Volume 19| Part 6| November 2012| Pages 976-987
https://doi.org/10.1107/S0909049512034486
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