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Figure 1
(a) Sketch of the photoelectron emission process. (b) Angle dependences of the X-ray reflectivity R, absorption depth d and the corresponding normal-emission IPE for Cu at hν = 400 eV in the FA (solid line) and FOVL (dashed) regimes. The decrease of d combined with an increase of R towards more grazing α forms the peak of IPE, prominent in the FA regime and only moderate in the FOVL regime.

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