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Figure 3
(a) SrTiO3 (100) and LaAlO3 (100) in a LaAlO3||SrTiO3 system where the SrTiO3 substrate is TiO2-terminated after hydrofluoric acid etching. (b) SrTiO3 (100) and LaAlO3 (100) in a LaAlO3||SrTiO3 system without pre-treatment of the substrate. Both samples are represented by the same intensity scheme for comparison.

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SYNCHROTRON
RADIATION
ISSN: 1600-5775
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