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Figure 11
(a) UV/VIS spectra taken during an oxygen plasma cleaning run using the traditional CCP RF gun (black line, static mode, 0.03 mbar) as well as the GV10x ICP RF gun (red line, dynamic mode, 0.01 mbar) with 50 W RF power. The spectra have been normalized at the peak intensity at 559 nm. (b) UV/VIS spectra taken during the oxygen cleaning run in Fig. 6[link] using the GV10x ICP RF gun with different O2 total pressures and RF powers. (c) Intensity of the OI emission line at 777 nm as a function of the carbon cleaning rate obtained using the different process parameters shown in Fig. 6[link] for pure O2 plasma (black line, closed symbols) and a 4% Ar in O2 gas mixture (blue line, open symbols).

Journal logoJOURNAL OF
SYNCHROTRON
RADIATION
ISSN: 1600-5775
Volume 21| Part 2| January 2014| Pages 300-314
doi:10.1107/S1600577513032402
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