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Figure 2
Typical cleaning curves obtained using the large traditional CCP RF gun in conjunction with an oxygen RF plasma. (a) Cleaning in static gas supply mode, (b) cleaning in dynamic gas supply mode. The vertical black arrows in (a) represent the O2 gas refills. Pressure and power figures indicate the different process parameters in terms of oxygen partial pressure and RF power, respectively. Green circles represent the end point of the cleaning process when the carbon coating on the QCM crystals is completely removed.

Journal logoJOURNAL OF
SYNCHROTRON
RADIATION
ISSN: 1600-5775
Volume 21| Part 2| January 2014| Pages 300-314
doi:10.1107/S1600577513032402
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