view article
Figure 4
UV/VIS spectra taken during an oxygen plasma cleaning run using the small CCP traditional plasma source in static mode with 75 W RF power at 0.03 mbar process in 5 minute time intervals.

Journal logoJOURNAL OF
SYNCHROTRON
RADIATION
ISSN: 1600-5775
Volume 21| Part 2| January 2014| Pages 300-314
doi:10.1107/S1600577513032402
Follow J. Synchrotron Rad.
Sign up for e-alerts
E-alerts
Follow J. Synchrotron Rad. on Twitter
Twitter
Follow us on facebook
Facebook
Sign up for RSS feeds
RSS