view article
Figure 2
High-resolution X-ray diffraction measurements of the STI etched silicon lines in the vicinity of the 004 Bragg reflection of silicon. The intensities are plotted on a logarithmic scale. For better visibility the colour bar covers only the diffuse scattering intensities in the 0 to 0.3 interval, although the substrate peak is very high and reaches a magnitude of 4.75.

Journal logoJOURNAL OF
SYNCHROTRON
RADIATION
ISSN: 1600-5775
Volume 21| Part 4| June 2014| Pages 774-783
doi:10.1107/S1600577514010108
Follow J. Synchrotron Rad.
Sign up for e-alerts
E-alerts
Follow J. Synchrotron Rad. on Twitter
Twitter
Follow us on facebook
Facebook
Sign up for RSS feeds
RSS