In situ synchrotron X-ray diffraction analysis of deformation behaviour in Ti–Ni-based thin films

Wang, H.; Sun, G.; Wang, X.; Chen, B.; Zu, X.; Liu, Y.; Li, L.; Pan, G.; Sheng, L.; Liu, Y.; Fu, Y.Q.

doi:10.1107/S1600577514021031

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Figure 4
Bright-field TEM micrograph of as-deposited Ti–Ni–Cu3.5 film revealing the fine 〈011〉 type-II twins. Selected area diffraction patterns with incident electron beam along [101]_M ∥ [−110]_T.

JOURNAL OF
SYNCHROTRON
RADIATION

ISSN: 1600-5775

Volume 22| Part 1| January 2015| Pages 34-41

https://doi.org/10.1107/S1600577514021031

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