Tuning the phase transition of ZnO thin films through lithography: an integrated bottom-up and top-down processing

Malfatti, L.; Pinna, A.; Enzo, S.; Falcaro, P.; Marmiroli, B.; Innocenzi, P.

doi:10.1107/S1600577514024047

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Figure 1
(a) FTIR absorption spectra in the 3050–2650 cm⁻¹ range of the ZnO samples exposed to different X-ray doses. (b) Degradation (%) as a function of exposure dose calculated as the change of the absorption area of the spectra in (a). The line is a guide for the eyes.

JOURNAL OF
SYNCHROTRON
RADIATION

ISSN: 1600-5775

Volume 22| Part 1| January 2015| Pages 165-171

https://doi.org/10.1107/S1600577514024047

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