Tuning the phase transition of ZnO thin films through lithography: an integrated bottom-up and top-down processing

Malfatti, L.; Pinna, A.; Enzo, S.; Falcaro, P.; Marmiroli, B.; Innocenzi, P.

doi:10.1107/S1600577514024047

Journal of Synchrotron Radiation Journal of
Synchrotron Radiation

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Figure 3
(a) Raman spectra in the 460–400 cm⁻¹ range of as-deposited films as a function of the exposure dose. (b) Raman spectra in the 460–400 cm⁻¹ range of films annealed at 300°C as a function of the exposure dose.

JOURNAL OF
SYNCHROTRON
RADIATION

ISSN: 1600-5775

Volume 22| Part 1| January 2015| Pages 165-171

https://doi.org/10.1107/S1600577514024047

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