Tuning the phase transition of ZnO thin films through lithography: an integrated bottom-up and top-down processing

Malfatti, L.; Pinna, A.; Enzo, S.; Falcaro, P.; Marmiroli, B.; Innocenzi, P.

doi:10.1107/S1600577514024047

Journal of Synchrotron Radiation Journal of
Synchrotron Radiation

IUCr IT WDC

home archive editors for authors for readers submit subscribe open access

view article

Figure 4
Thickness and refractive index of the samples as a function of the exposure dose, as measured by spectroscopy ellipsometry. The lines are a guide for the eyes.

JOURNAL OF
SYNCHROTRON
RADIATION

ISSN: 1600-5775

Volume 22| Part 1| January 2015| Pages 165-171

https://doi.org/10.1107/S1600577514024047

Follow J. Synchrotron Rad.

Search IUCr Journals		doi		Advanced search
Author		volume	page