Tuning the phase transition of ZnO thin films through lithography: an integrated bottom-up and top-down processing

Malfatti, L.; Pinna, A.; Enzo, S.; Falcaro, P.; Marmiroli, B.; Innocenzi, P.

doi:10.1107/S1600577514024047

Journal of Synchrotron Radiation Journal of
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Figure 7
Schematic of the DXRL process; at first the film is exposed to hard X-rays (a) then the not-exposed regions are removed from the substrate through development (b). (c) Optical microscope image and (d) X-ray fluorescence map obtained from the integration of the Zn signal on a ZnO film after patterning with a 356 J cm⁻² X-ray dose and development.

JOURNAL OF
SYNCHROTRON
RADIATION

ISSN: 1600-5775

Volume 22| Part 1| January 2015| Pages 165-171

https://doi.org/10.1107/S1600577514024047

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